
Standard Test Method for Thickness of Epitaxial or Diffused Layers in Silicon by the Angle Lapping and Staining Technique (Withdrawn 2003) (Includes all amendments And changes 8/16/2017).
STANDARD published on 10.12.2000
Designation standards: ASTM F110-00a
Note: WITHDRAWN
Publication date standards: 10.12.2000
The number of pages: 4
Approximate weight : 12 g (0.03 lbs)
Country: American technical standard
Category: Technical standards ASTM
Keywords:
angle lapping, diffused layer, epitaxial layer, etching, fringe count, staining, thickness, ICS Number Code 29.045 (Semiconducting materials)