
Standard Test Methods for Oxygen Precipitation Characterization of Silicon Wafers by Measurement of Interstitial Oxygen Reduction (Withdrawn 2003)
STANDARD published on 10.1.2002
Designation standards: ASTM F1239-02
Note: WITHDRAWN
Publication date standards: 10.1.2002
The number of pages: 5
Approximate weight : 15 g (0.03 lbs)
Country: American technical standard
Category: Technical standards ASTM
Keywords:
delta O, interstitial oxygen, oxygen precipitation, oxygen reduction, silicon, ICS Number Code 29.045 (Semiconducting materials)