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ASTM F1366-92(2002)

Standard Test Method for Measuring Oxygen Concentration in Heavily Doped Silicon Substrates by Secondary Ion Mass Spectrometry (Withdrawn 2003)

STANDARD published on 1.1.1992

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The information about the standard:

Designation standards: ASTM F1366-92(2002)
Note: WITHDRAWN
Publication date standards: 1.1.1992
The number of pages: 5
Approximate weight : 15 g (0.03 lbs)
Country: American technical standard
Category: Technical standards ASTM

Annotation of standard text ASTM F1366-92(2002) :

Keywords:
FTIR, oxygen, secondary ion mass spectometry, silicon, ICS Number Code 29.045 (Semiconducting materials)