
Standard Test Method for Measuring Oxygen Concentration in Heavily Doped Silicon Substrates by Secondary Ion Mass Spectrometry (Withdrawn 2003)
STANDARD published on 1.1.1992
Designation standards: ASTM F1366-92(2002)
Note: WITHDRAWN
Publication date standards: 1.1.1992
The number of pages: 5
Approximate weight : 15 g (0.03 lbs)
Country: American technical standard
Category: Technical standards ASTM
Keywords:
FTIR, oxygen, secondary ion mass spectometry, silicon, ICS Number Code 29.045 (Semiconducting materials)