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ASTM F1404-92(1999)

Test Method for Crystallographic Perfection of Gallium Arsenide by Molten Potassium Hydroxide (KOH) Etch Technique

STANDARD published on 10.6.1999

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The information about the standard:

Designation standards: ASTM F1404-92(1999)
Note: WITHDRAWN
Publication date standards: 10.6.1999
The number of pages: 6
Approximate weight : 18 g (0.04 lbs)
Country: American technical standard
Category: Technical standards ASTM

Annotation of standard text ASTM F1404-92(1999) :

Keywords:
Contamination-semiconductors, Crystal lattice structure, Defects-semiconductors, Density-electronic applications, Etch pit density (EPD), Gallium arsenide, Impurities-semiconductors, KOH etch pits, Microscopic examination-electronic materials, Molten KOH etch technique, Monocrystalline perfection, crystallographic perfection of (doped/undoped) gallium arsenide, ingot/wafer, by molten KOH etch technique, test, ICS Number Code 71.060.50 (Salts)