Test Method for Crystallographic Perfection of Gallium Arsenide by Molten Potassium Hydroxide (KOH) Etch Technique (Withdrawn 2016)

The information about the standard:

Designation standards: ASTM F1404-92(2007)
Note: WITHDRAWN
Publication date standards: 1.12.2007
The number of pages: 6
Approximate weight : 18 g (0.04 lbs)
Country: American technical standard
Category: Technical standards ASTM

Annotation of standard text ASTM F1404-92(2007) :

Keywords:
crystal perfection, etch pit density, gallium arsenide, potassium hydroxide etch, semiconductor, single crystal, Contamination semiconductors, Crystal lattice structure, Defects semiconductors, Density electronic applications, Etching (materials/process), Etch pit density (EPD), Gallium arsenide, Impurities electronic materials/applications, KOH etch pits, Microscopic examination electronic materials, Molten KOH etch technique, Monocrystalline perfection