ASTM F1727-02

Standard Practice for Detection of Oxidation Induced Defects in Polished Silicon Wafers (Withdrawn 2003)

STANDARD published on 10.12.2002

English -
PDF - Immediate download (73.00 USD)

The information about the standard:

Designation standards: ASTM F1727-02
Note: WITHDRAWN
Publication date standards: 10.12.2002
The number of pages: 3
Approximate weight : 9 g (0.02 lbs)
Country: American technical standard
Category: Technical standards ASTM

Annotation of standard text ASTM F1727-02 :

Keywords:
defects, dislocation, epitaxy, hillock, imperfections, oxidation, preferential etch, shallow pit, silicon, slip, stacking fault, swirl, ICS Number Code 29.045 (Semiconducting materials)