ASTM F1727-97

Standard Practice for Detection of Oxidation Induced Defects in Polished Silicon Wafers

STANDARD published on 10.6.1997

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The information about the standard:

Designation standards: ASTM F1727-97
Note: WITHDRAWN
Publication date standards: 10.6.1997
The number of pages: 3
Approximate weight : 9 g (0.02 lbs)
Country: American technical standard
Category: Technical standards ASTM

Annotation of standard text ASTM F1727-97 :

Keywords:
defects, dislocation, epitaxy, hillock, imperfections, oxidation, preferential etch, shallow pit, silicon, slip, stacking fault, swirl, ICS Number Code 29.045 (Semiconducting materials)