ASTM F1771-97(2002)

Standard Test Method for Evaluating Gate Oxide Integrity by Voltage Ramp Technique (Withdrawn 2003)

STANDARD published on 10.2.1997

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The information about the standard:

Designation standards: ASTM F1771-97(2002)
Note: WITHDRAWN
Publication date standards: 10.2.1997
The number of pages: 8
Approximate weight : 24 g (0.05 lbs)
Country: American technical standard
Category: Technical standards ASTM

Annotation of standard text ASTM F1771-97(2002) :

Keywords:
current density, defect density, electric field strength, extrinsic breakdown, intrinsic breakdown, oxide breakdown, ICS Number Code 29.045 (Semiconducting materials)