ASTM F950-02

Standard Test Method for Measuring the Depth of Crystal Damage of a Mechanically Worked Silicon Slice Surface by Angle Polishing and Defect Etching (Withdrawn 2003)

STANDARD published on 10.12.2002

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The information about the standard:

Designation standards: ASTM F950-02
Note: WITHDRAWN
Publication date standards: 10.12.2002
The number of pages: 6
Approximate weight : 18 g (0.04 lbs)
Country: American technical standard
Category: Technical standards ASTM

Annotation of standard text ASTM F950-02 :

Keywords:
bevel polish, damage-depth, defect, preferential etch, silicon, ICS Number Code 29.045 (Semiconducting materials)