ASTM F950-98

Standard Test Method for Measuring the Depth of Crystal Damage of a Mechanically Worked Silicon Slice Surface by Angle Polishing and Defect Etching

STANDARD published on 10.5.1998

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The information about the standard:

Designation standards: ASTM F950-98
Note: WITHDRAWN
Publication date standards: 10.5.1998
The number of pages: 5
Approximate weight : 15 g (0.03 lbs)
Country: American technical standard
Category: Technical standards ASTM

Annotation of standard text ASTM F950-98 :

Keywords:
bevel polish, damage-depth, defect, preferential etch, silicon, ICS Number Code 29.045 (Semiconducting materials)