Standard Test Method for Measuring Flatness, Thickness, and Thickness Variation on Silicon Wafers by Automated Noncontact Scanning
STANDARD published on 1.1.1994
Designation standards: ASTM F1530-94
Note: WITHDRAWN
Publication date standards: 1.1.1994
The number of pages: 7
Approximate weight : 21 g (0.05 lbs)
Country: American technical standard
Category: Technical standards ASTM
Keywords:
Flatness-semiconductors, Noncontact technique, Nondestructive evaluation (NDE)-semiconductors, Probe methods, Silicon semiconductors-slices/wafers, Silicon semiconductors-slices/wafers, Thickness-semiconductors, Thickness variation, Wafers, silicon wafers-flatness/thickness/thickness variation, by automated, noncontact scanning, test, ICS Number Code 29.045 (Semiconducting materials)