Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy. Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films.
STANDARD published on 31.8.2015
Designation standards: BS ISO 17109:2015
Note: WITHDRAWN
Publication date standards: 31.8.2015
The number of pages: 28
Approximate weight : 84 g (0.19 lbs)
Country: British technical standard
Category: Technical standards BS