DIN 50453-2:2023-08

Testing of materials for semiconductor technology - Determination of etch rates of etching mixtures - Part 2: Silicon-dioxide coating, optical method.

STANDARD published on 1.8.2023

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The information about the standard:

Designation standards: DIN 50453-2:2023-08
Publication date standards: 1.8.2023
The number of pages: 9
Approximate weight : 27 g (0.06 lbs)
Country: German technical standard
Category: Technical standards DIN

Annotation of standard text DIN 50453-2:2023-08 :

Prüfung von Materialien für die Halbleitertechnologie - Bestimmung der Ätzrate von Ätzmischungen - Teil 2: Siliciumdioxid-Schichten, Optisches Verfahren.