GB/T 14847-2025

Test method for thickness of lightly doped silicon epitaxial layers on heavily doped silicon substrates—Infrared reflectance method

STANDARD published on 31.10.2025

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The information about the standard:

Designation standards: GB/T 14847-2025
Note: Execute Date: may 2026
Publication date standards: 31.10.2025
Country: Chinese technical standard
Category: Technical standards GB