GB/T 25188-2010

Thickness measurements for ultrathin silicon oxide layers on silicon wafers X-ray photoelectron spectroscopy

STANDARD published on 26.9.2010

English, Chinese -
electronic design (pdf) (274.80 USD)

The information about the standard:

Designation standards: GB/T 25188-2010
Publication date standards: 26.9.2010
Country: Chinese technical standard
Category: Technical standards GB