Surface chemical analysis — Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy
STANDARD published on 18.5.2004
Designation standards: ISO 17331:2004
Publication date standards: 18.5.2004
The number of pages: 18
Approximate weight : 54 g (0.12 lbs)
Country: International technical standard
Category: Technical standards ISO
Description / Abstract: ISO 17331:2004 specifies chemical methods for the collection of iron and/or nickel from the surface of silicon-wafer working reference materials by the vapour-phase decomposition method or the direct acid droplet decomposition method. It applies to iron and/or nickel atomic surface densities from 6 times 10 to the power 9 atoms per square centimetre to 5 times 10 to the power 11 atoms per square centimetre.