Microbeam analysis — Scanning electron microscopy — Method for evaluating critical dimensions by CD-SEM

The information about the standard:

Designation standards: ISO 21466:2019
Publication date standards: 13.12.2019
The number of pages: 47
Approximate weight : 141 g (0.31 lbs)
Country: International technical standard
Category: Technical standards ISO

Annotation of standard text ISO 21466:2019 :

Description / Abstract: This document specifies the structure model with related parameters, file format and fitting procedure for characterizing critical dimension (CD) values for wafer and photomask by imaging with a critical dimension scanning electron microscope (CD-SEM) by the model-based library (MBL) method. The method is applicable to linewidth determination for specimen, such as, gate on wafer, photomask, single isolated or dense line feature pattern down to size of 10 nm.