Fine ceramics (advanced ceramics, advanced technical ceramics) — Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment
STANDARD published on 18.6.2019
Designation standards: ISO 21859:2019
Publication date standards: 18.6.2019
The number of pages: 4
Approximate weight : 12 g (0.03 lbs)
Country: International technical standard
Category: Technical standards ISO
Description / Abstract: This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.