Standard Guide for Depth Profiling in Auger Electron Spectroscopy
STANDARD published on 1.6.2015
Designation standards: ASTM E1127-08(2015)
Publication date standards: 1.6.2015
The number of pages: 5
Approximate weight : 15 g (0.03 lbs)
Country: American technical standard
Category: Technical standards ASTM
angle lapping, angle-resolved AES, Auger electron spectroscopy, ball cratering, compositional depth profiling, cross sectioning, depth profiling, depth resolution, sputter depth profiling, sputtering, thin films,, ICS Number Code 71.040.50 (Physicochemical methods of analysis)
|Significance and Use|
5.1 Auger electron spectroscopy yields information concerning the chemical and physical state of a solid surface in the near surface region. Nondestructive depth profiling is limited to this near surface region. Techniques for measuring the crater depths and film thicknesses are given in (. )
5.2 Ion sputtering is primarily used for depths of less than the order of 1 μm.
5.3 Angle lapping or mechanical cratering is primarily used for depths greater than the order of 1 μm.
5.4 The choice of depth profiling methods for investigating an interface depends on surface roughness, interface roughness, and film thickness (. )
5.5 The depth profile interface widths can be measured using a logistic function which is described in Practice .
1.1 This guide covers procedures used for depth profiling in Auger electron spectroscopy.
1.2 Guidelines are given for depth profiling by the following:
1.3 The values stated in SI units are to be regarded as standard. No other units of measurement are included in this standard.
1.4 This standard does not purport to address all of the safety problems, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use.
|2. Referenced Documents|
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