Standard Test Method for Strain Gradient Measurements of Thin, Reflecting Films Using an Optical InterferometerTranslate name
STANDARD published on 1.5.2018
Designation standards: ASTM E2246-11(2018)
Publication date standards: 1.5.2018
The number of pages: 21
Approximate weight : 63 g (0.14 lbs)
Country: American technical standard
Category: Technical standards ASTM
cantilevers, combined standard uncertainty, fixed-fixed beams, interferometry, length measurements, microelectromechanical systems, MEMS, polysilicon, residual strain, round robin, stiction, strain gradient, test structure,, ICS Number Code 37.040.20 (Photographic paper, film and plates. Cartridges)
|Significance and Use|
5.1 Strain gradient values are an aid in the design and fabrication of MEMS devices.
1.1 This test method covers a procedure for measuring the strain gradient in thin, reflecting films. It applies only to films, such as found in microelectromechanical systems (MEMS) materials, which can be imaged using an optical interferometer, also called an interferometric microscope. Measurements from cantilevers that are touching the underlying layer are not accepted.
1.2 This test method uses a non-contact optical interferometric microscope with the capability of obtaining topographical 3-D data sets. It is performed in the laboratory.
1.3 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety, health, and environmental practices and determine the applicability of regulatory limitations prior to use.
1.4 This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee.
|2. Referenced Documents|
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