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WITHDRAWN ASTM E2444-05 1.5.2005 preview

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ASTM E2444-05

Terminology Relating to Measurements Taken on Thin, Reflecting Films



STANDARD published on 1.5.2005


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The information about the standard:

Designation standards: ASTM E2444-05
Note: WITHDRAWN
Publication date standards: 1.5.2005
SKU: NS-45309
The number of pages: 3
Approximate weight : 9 g (0.02 lbs)
Country: American technical standard
Category: Technical standards ASTM

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Annotation of standard text ASTM E2444-05 :

Keywords:

ICS Number Code 01.040.31 (Electronics (Vocabularies)),31.240 (Mechanical structures for electronic equipment)

Additional information

 
1. Scope

1.1 This standard consists of terms and definitions pertaining to measurements taken on thin, reflecting films, such as found in microelectromechanical systems (MEMS) materials. In particular, the terms are related to the standards in Section , which were generated by Committee E08 on Fatigue and Fracture. Terminology E 1823 Relating to Fatigue and Fracture Testing is applicable to this standard.

1.2 The terms are listed in alphabetical order.
 
2. Referenced Documents

E2246-11

Standard Test Method for Strain Gradient Measurements of Thin, Reflecting Films Using an Optical Interferometer

E1823-23

Standard Terminology Relating to Fatigue and Fracture Testing

E2244-11

Standard Test Method for In-Plane Length Measurements of Thin, Reflecting Films Using an Optical Interferometer

E2245-11

Standard Test Method for Residual Strain Measurements of Thin, Reflecting Films Using an Optical Interferometer

Latest update: 2026-04-06 (Number of items: 2 271 069)
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