ASTM E2444-11e1

Terminology Relating to Measurements Taken on Thin, Reflecting Films (Includes all amendments And changes 5/28/2018).

Automatically translated name:

Terminology Relating to Measurements Taken on Thin, Reflecting Films

STANDARD published on 15.10.2011

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The information about the standard:

Designation standards: ASTM E2444-11e1
Note: WITHDRAWN
Publication date standards: 15.10.2011
SKU: NS-45312
The number of pages: 2
Approximate weight : 6 g (0.01 lbs)
Country: American technical standard
Category: Technical standards ASTM

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The category - similar standards:

Electronics (Vocabularies)Mechanical structures for electronic equipment

Annotation of standard text ASTM E2444-11e1 :

Keywords:

cantilevers, definitions, fixed-fixed beams, interferometry, length measurements, microelectromechanical systems, MEMS, polysilicon, residual strain, stiction, strain gradient, terminology, test structure, ICS Number Code 01.040.31 (Electronics (Vocabularies)), 31.240 (Mechanical structures for electronic equipment)

Additional information

1. Scope

1.1 This standard consists of terms and definitions pertaining to measurements taken on thin, reflecting films, such as found in microelectromechanical systems (MEMS) materials. In particular, the terms are related to the standards in Section , which were generated by Committee E08 on Fatigue and Fracture. Terminology E 1823 Relating to Fatigue and Fracture Testing is applicable to this standard.

1.2 The terms are listed in alphabetical order.

2. Referenced Documents

E2246-11	Standard Test Method for Strain Gradient Measurements of Thin, Reflecting Films Using an Optical Interferometer
E1823-23	Standard Terminology Relating to Fatigue and Fracture Testing
E2244-11	Standard Test Method for In-Plane Length Measurements of Thin, Reflecting Films Using an Optical Interferometer
E2245-11	Standard Test Method for Residual Strain Measurements of Thin, Reflecting Films Using an Optical Interferometer

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