We need your consent to use the individual data so that you can see information about your interests, among other things. Click "OK" to give your consent.
Standard Specification for Refractory Silicide Sputtering Targets for Microelectronic Applications
STANDARD published on 10.12.1999
Designation standards: ASTM F1238-95(1999)
Note: WITHDRAWN
Publication date standards: 10.12.1999
SKU: NS-49599
The number of pages: 2
Approximate weight : 6 g (0.01 lbs)
Country: American technical standard
Category: Technical standards ASTM
Keywords:
density, microelectronics, molybdenum, disilicide, refractory silicides, sputtering, sputtering targets, tantalum disilicide, titanium disilicide, tungsten disilicide, ICS Number Code 31.100 (Electronic tubes)
| 1. Scope |
|
1.1 This specification covers sputtering targets fabricated from metallic silicides (molybdenum silicide, tantalum silicide, titanium silicide, and tungsten silicide). These targets are referred to as refractory silicide targets, and are intended for use in microelectronic applications. 1.2 The values stated in SI units are regarded as standard. |
Do you want to make sure you use only the valid technical standards?
We can offer you a solution which will provide you a monthly overview concerning the updating of standards which you use.
Would you like to know more? Look at this page.
Latest update: 2025-12-18 (Number of items: 2 252 678)
© Copyright 2025 NORMSERVIS s.r.o.