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Standard Test Method for Determining the Average Electrical Width of a Straight, Thin-Film Metal Line [Metric]
STANDARD published on 1.1.1996
Designation standards: ASTM F1261M-96
Note: WITHDRAWN
Publication date standards: 1.1.1996
SKU: NS-49668
The number of pages: 4
Approximate weight : 12 g (0.03 lbs)
Country: American technical standard
Category: Technical standards ASTM
Keywords:
aluminum, electrical interconnect, electrical linewidth, linewidth, metallization, semiconductor, test structure, thin film, ICS Number Code 31.080.01 (Semi-conductor devices in general)
1. Scope | ||||
1.1 This test method is designed for determining the average electrical width of a narrow thin-film metallization line. 1.2 This test method is intended for measuring thin metallization lines such as are used in microelectronic circuits where the width of the lines may range from micrometres to tenths of micrometres. 1.3 The test structure used in this test method may be measured while still part of a wafer, or part therefrom, or as part of a test chip bonded to a package and electrically accessible by means of package terminals. 1.4 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use. |
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2. Referenced Documents | ||||
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