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ASTM F1513-99
Standard Specification for Pure Aluminum (Unalloyed) Source Material for Electronic Thin Film Applications
STANDARD published on 10.12.1999
The information about the standard:
Designation standards: ASTM F1513-99
Note: WITHDRAWN
Publication date standards: 10.12.1999
SKU: NS-50591
The number of pages: 2
Approximate weight : 6 g (0.01 lbs)
Country: American technical standard
Category: Technical standards ASTM
Annotation of standard text ASTM F1513-99 :
Keywords:
aluminum, coating, evaporation, sputtering, targets, thin films, vacuum coating, ICS Number Code 31.200 (Integrated circuits. Microelectronics)
Additional information
| 1. Scope | ||
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1.1 This specification covers pure aluminum metal (unalloyed) for use in evaporation sources and sputtering targets. This material is intended as a raw material for electronic applications. The material is used as-supplied in some cases (for example, as e-beam evaporation sources). In other instances it may be remelted, alloyed, cast and processed by the purchaser to make finished products (for example, sputtering targets). 1.2 This specification sets purity grade levels, physical attributes, analytical methods, and packaging. 1.3 The values stated in SI units are to be regarded as the standard. The values given in parentheses are for information only. |
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| 2. Referenced Documents | ||
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