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ASTM F154-02
Standard Guide for Identification of Structures and Contaminants Seen on Specular Silicon Surfaces (Withdrawn 2003)
STANDARD published on 10.1.2001
The information about the standard:
Designation standards: ASTM F154-02
Note: WITHDRAWN
Publication date standards: 10.1.2001
SKU: NS-50669
The number of pages: 13
Approximate weight : 39 g (0.09 lbs)
Country: American technical standard
Category: Technical standards ASTM
Annotation of standard text ASTM F154-02 :
Keywords:
contaminant, defects, dislocation, epitaxial, fracture, preferential etch, scratch, shallow pit, silicon, slip, stacking fault, ICS Number Code 17.040.20 (Properties of surfaces)
Additional information
| 1. Scope |
|
This standard was transferred to SEMI (www.semi.org) May 2003 1.1 The purpose of this guide is to list, illustrate, and provide reference for various characteristic features and contaminants that are seen on highly specular silicon wafers. Recommended practices for delineation and observation of these artifacts are referenced. The artifacts described in this guide are intended to parallel and support the content of the SEMI M18. These artifacts and common synonyms are arranged alphabetically in Tables 1 and 2 and illustrated in Figs. 1-68 . |
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