Cookies
We need your consent to use the individual data so that you can see information about your interests, among other things. Click "OK" to give your consent.
ASTM F1630-00
Standard Test Method for Low Temperature FT-IR Analysis of Single Crystal Silicon for III-V Impurities (Withdrawn 2003)
STANDARD published on 10.12.2000
The information about the standard:
Designation standards: ASTM F1630-00
Note: WITHDRAWN
Publication date standards: 10.12.2000
SKU: NS-50963
The number of pages: 6
Approximate weight : 18 g (0.04 lbs)
Country: American technical standard
Category: Technical standards ASTM
Annotation of standard text ASTM F1630-00 :
Keywords:
analysis of silicon, determination of dopants, determination of impurities, electrically active impurities, Fourier transform infrared, impurities, silicon, ICS Number Code 29.045 (Semiconducting materials)
Additional information
| 1. Scope |
|
This standard was transferred to SEMI (www.semi.org) May 2003 1.1 This test method covers the determination of electrically active boron, phosphorus, arsenic, aluminum, antimony, and gallium concentration in single crystal silicon. 1.2 This test method can be used for silicon in which the impurity/dopant concentrations are between 0.01 ppba and 5.0 ppba for each of the electrically active elements. 1.3 The concentration for each impurity/dopant can be obtained by application of Beer's Law. Calibration factors are given for each element. 1.4 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use. |
We recommend:
Updating of laws
Do you want to be sure about the validity of used regulations?
We offer you a solution so that you could use valid and updated legislative regulations.
Would you like to get more information? Look at this page.
