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Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications (Withdrawn 2023)
Translate name
STANDARD published on 1.5.2016
Designation standards: ASTM F1709-97(2016)
Note: WITHDRAWN
Publication date standards: 1.5.2016
SKU: NS-638477
The number of pages: 3
Approximate weight : 9 g (0.02 lbs)
Country: American technical standard
Category: Technical standards ASTM
Keywords:
coating, sputtering, target, thin film, titanium ,, ICS Number Code 31.120 (Electronic display devices)
1. Scope | ||
1.1 This specification covers pure titanium sputtering targets used as a raw material in fabricating semiconductor electronic devices. 1.2 This standard sets purity grade levels, physical attributes, analytical methods, and packaging. 1.2.1 The grade designation is a measure of total metallic impurity content. The grade designation does not necessarily indicate suitability for a particular application because factors other than total metallic impurity may influence performance. |
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2. Referenced Documents | ||
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