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Standard Test Method for Trace Metallic Impurities in Electronic Grade Aluminum-Copper, Aluminum-Silicon, and Aluminum-Copper-Silicon Alloys by High-Mass-Reduction Glow Discharge Mass Spectrometer
STANDARD published on 10.12.1997
Designation standards: ASTM F1845-97
Note: WITHDRAWN
Publication date standards: 10.12.1997
SKU: NS-51795
The number of pages: 4
Approximate weight : 12 g (0.03 lbs)
Country: American technical standard
Category: Technical standards ASTM
Keywords:
aluminum, aluminum-copper alloys, aluminum-copper-silicon alloys, aluminum-silicon alloys, electronics, glow dishcarge mass spectrometer (GDMS), purity analysis, sputtering target, trace metallic impurities
| 1. Scope | ||||
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1.1 This test method determines the concentrations of trace metallic impurities in high purity (99.99 wt. % pure, or purer, with respect to metallic trace impurities) aluminum-copper, aluminum-silicon and aluminum-copper-silicon alloys with major alloy constituents as follows: aluminum---Greater than 95.0% 1.2 This test method pertains to analysis by magnetic-sector glow discharge mass spectrometer (GDMS). 1.3 This test method does not include all the information needed to complete GDMS analyses. Sophisticated computer-controlled laboratory equipment, skillfully used by an experienced operator, is required to achieve the required sensitivity. This test method does cover the particular factors (for example, specimen preparations, setting of relative sensitivity factors, determination of detection limits, etc.) known by the responsible technical committee to effect the reliability of high purity aluminum analyses. 1.4 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use. |
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