ASTM D3004-08(2013)..
ASTM D6095-12
ASTM E1438-11
ASTM F1894-98(2011)..
ASTM F615M-95(2013)..
ASTM F76-08
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ASTM F2113-01(2011)
Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications (Withdrawn 2020)
Automatically translated name:
Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications
STANDARD published on 1.6.2011
The information about the standard:
Designation standards: ASTM F2113-01(2011)
Note: WITHDRAWN
Publication date standards: 1.6.2011
SKU: NS-52871
The number of pages: 2
Approximate weight : 6 g (0.01 lbs)
Country: American technical standard
Category: Technical standards ASTM
The category - similar standards:
Annotation of standard text ASTM F2113-01(2011) :
Keywords:
electronics, purity analysis, purity grade, sputtering, target, thin film, Electronic thin-film applications, High-purity metallic sputtering targets, Impurities--electronic materials/applications, Semiconductor device testing, Sputtering process/targets, Target specifications, Thin film applications, ICS Number Code 29.045 (Semiconducting materials)
Additional information
| 1. Scope | ||
|
1.1 This guide covers sputtering targets used as thin film source material in fabricating semiconductor electronic devices. It should be used to develop target specifications for specific materials and should be referenced therein. 1.2 This standard sets purity grade levels, analytical methods and impurity content reporting method and format. 1.2.1 The grade designation is a measure of total metallic impurity content. The grade designation does not necessarily indicate suitability for a particular application because factors other than total metallic impurity may influence performance. |
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| 2. Referenced Documents | ||
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