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ASTM F2113-01e1
Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications (Includes all amendments And changes 8/16/2017).
Automatically translated name:
Standard Guide for Analysis and Reporting the Impurity Content and Grade of High Purity Metallic Sputtering Targets for Electronic Thin Film Applications
STANDARD published on 10.6.2001
The information about the standard:
Designation standards: ASTM F2113-01e1
Note: WITHDRAWN
Publication date standards: 10.6.2001
SKU: NS-52873
The number of pages: 2
Approximate weight : 6 g (0.01 lbs)
Country: American technical standard
Category: Technical standards ASTM
Annotation of standard text ASTM F2113-01e1 :
Keywords:
electronics, purity analysis, purity grade, sputtering, target, thin film, ICS Number Code 29.045 (Semiconducting materials)
Additional information
| 1. Scope | ||
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1.1 This guide covers sputtering targets used as thin film source material in fabricating semiconductor electronic devices. It should be used to develop target specifications for specific materials and should be referenced therein. 1.2 This standard sets purity grade levels, analytical methods and impurity content reporting method and format. 1.2.1 The grade designation is a measure of total metallic impurity content. The grade designation does not necessarily indicate suitability for a particular application because factors other than total metallic impurity may influence performance. |
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| 2. Referenced Documents | ||
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