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Practice for Determining Effective Adhesion of Photoresist to Hard-Surface Photomask Banks and Semiconductor Wafers During Etching (Withdrawn 1996)
Designation standards: ASTM F518-77(1991)E01
Note: WITHDRAWN
SKU: NS-55595
The number of pages: 5
Approximate weight : 15 g (0.03 lbs)
Country: American technical standard
Category: Technical standards ASTM
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Latest update: 2024-05-17 (Number of items: 2 902 148)
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