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Test Method for Characterization of Film Resistor Materials and Processes (Withdrawn 1996)
STANDARD published on 1.1.1983
Designation standards: ASTM F817-83(1990)
Note: WITHDRAWN
Publication date standards: 1.1.1983
SKU: NS-56533
The number of pages: 16
Approximate weight : 48 g (0.11 lbs)
Country: American technical standard
Category: Technical standards ASTM
Keywords:
Diffusion, Electrical conductors-semiconductors, Film resistors, Linwood least squares test, Microcircuits, Resistance and resistivity (electrical)-semiconductors, Resistors-film, Statistical methods-electronic components/devices, film resistor (thick/thin) materials/processes-characterization, test
1. Scope |
1.1 This method determines a characteristic equation that describes the overall characteristics of a resistor material and the process used to produce thick or thin film resistors. 1.2 This method provides two linear, statistical models for characterizing film resistors that are simple rectangles. Both models are derived from a common, ideal model for a rectangular film resistor. 1.3 This method describes a characterization of resistor material and processing that has been used to design a number of hybrid microcircuits without trial-and-error design for the resistors. 1.4 This standard may involve hazardous materials, operations, and equipment. This standard does not purport to address all of the safety problems associated with its use. It is the responsibility of whoever uses this standard to consult and establish appropriate safety and health practices and determine the applicability of regulatory limitations prior to use. |
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