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Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter dept profiling using single and multi-layer thin films.
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STANDARD published on 31.3.2022
Designation standards: BS ISO 17109:2022
Publication date standards: 31.3.2022
SKU: NS-1197867
The number of pages: 32
Approximate weight : 96 g (0.21 lbs)
Country: British technical standard
Category: Technical standards BS
ISBN: 978 0 539 19125 7 Status: Definitive
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