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Testing of materials for semiconductor technology - Determination of impurities in carrier gases and dopant gases - Part 2: Determination of Oxygen impurities in Nitrogen, Argon, Helium, Neon and Hydrogen using a galvanic cell.
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STANDARD published on 1.3.2026
Designation standards: DIN 50450-2:2026-03
Publication date standards: 1.3.2026
SKU: NS-1260827
The number of pages: 9
Approximate weight : 27 g (0.06 lbs)
Country: German technical standard
Category: Technical standards DIN
Prüfung von Materialien für die Halbleitertechnologie - Bestimmung von Verunreinigungen in Träger- und Dotiergasen - Teil 2: Bestimmung der Sauerstoffverunreinigung in Stickstoff, Argon, Helium, Neon und Wasserstoff mittels einer galvanischen Messzelle.
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