Standard GB/T 14847-2010 10.1.2011 preview

GB/T 14847-2010

Test mothod for thickness of lightly doped silicon epitaxial layers on heavily doped silicon substrates by infrared reflectance

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STANDARD published on 10.1.2011


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310.80 USD

The information about the standard:

Designation standards: GB/T 14847-2010
Publication date standards: 10.1.2011
SKU: NS-865732
Country: Chinese technical standard
Category: Technical standards GB

The category - similar standards:

Semiconducting materials

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