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Test method for thickness of lightly doped silicon epitaxial layers on heavily doped silicon substrates—Infrared reflectance method
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STANDARD published on 31.10.2025
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Designation standards: GB/T 14847-2025
Note: Execute Date: may 2026
Publication date standards: 31.10.2025
SKU: NS-1247397
Country: Chinese technical standard
Category: Technical standards GB
Latest update: 2025-12-16 (Number of items: 2 252 193)
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