Cookies
We need your consent to use the individual data so that you can see information about your interests, among other things. Click "OK" to give your consent.
GB/T 29056-2012
Trichlorosilane for silicon epitaxy - Determination of boronaluminiumphosphorusvanadiumchromemanganeseironcobaltnickelcoppermolybdenumarsenic and antimony content - Inductively coupled plasma mass spectrometric method
Automatically translated name:
Trichlorosilane for silicon epitaxy - Determination of boron,?luminium,phosphorus,vanadium,chrome,manganese,?ron,cobalt,nickel,copper,molybdenum,?rsenic and antimony content - Inductively coupled plasma mass spectrometric method
STANDARD published on 31.12.2012
The information about the standard:
Designation standards: GB/T 29056-2012
Note: WITHDRAWN
Publication date standards: 31.12.2012
SKU: NS-364825
Country: Chinese technical standard
Category: Technical standards GB
We recommend:
Technical standards updating
Do you want to make sure you use only the valid technical standards?
We can offer you a solution which will provide you a monthly overview concerning the updating of standards which you use.
Would you like to know more? Look at this page.
