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Surface chemical analysis—Depth profiling—Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
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STANDARD published on 31.12.2021
Designation standards: GB/T 41064-2021
Publication date standards: 31.12.2021
SKU: NS-1047145
Country: Chinese technical standard
Category: Technical standards GB
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