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ISO 16531:2020-ed.2.0
Surface chemical analysis — Depth profiling — Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS
Translate name
STANDARD published on 5.10.2020
The information about the standard:
Designation standards: ISO 16531:2020-ed.2.0
Publication date standards: 5.10.2020
SKU: NS-1007044
The number of pages: 19
Approximate weight : 57 g (0.13 lbs)
Country: International technical standard
Category: Technical standards ISO
The category - similar standards:
Annotation of standard text ISO 16531:2020-ed.2.0 :
Description / Abstract: This document specifies methods for the alignment of the ion beam to ensure good depth resolution in sputter depth profiling and optimal cleaning of surfaces when using inert gas ions in Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS). These methods are of two types: one involves a Faraday cup to measure the ion current; the other involves imaging methods. The Faraday cup method also specifies the measurements of current density and current distributions in ion beams. The methods are applicable for ion guns with beams with a spot size less than or equal to 1 mm in diameter. The methods do not include depth resolution optimization.
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