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ISO 17331:2004
Surface chemical analysis — Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy
Automatically translated name:
Surface chemical analysis -- Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy
STANDARD published on 18.5.2004
The information about the standard:
Designation standards: ISO 17331:2004
Publication date standards: 18.5.2004
SKU: NS-427604
The number of pages: 18
Approximate weight : 54 g (0.12 lbs)
Country: International technical standard
Category: Technical standards ISO
The category - similar standards:
Annotation of standard text ISO 17331:2004 :
Description / Abstract: ISO 17331:2004 specifies chemical methods for the collection of iron and/or nickel from the surface of silicon-wafer working reference materials by the vapour-phase decomposition method or the direct acid droplet decomposition method. It applies to iron and/or nickel atomic surface densities from 6 times 10 to the power 9 atoms per square centimetre to 5 times 10 to the power 11 atoms per square centimetre.
These changes apply to this standard:
ISO 17331:2004/Amd1:2010
Change
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Surface chemical analysis — Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy — Amendment 1
(Analyse chimique des surfaces — Méthodes chimiques pour collecter les éléments analysés de tranches de silicium comme matériaux de référence pour l´analyse par spectroscopie de fluorescence X en réflexion totale (TXRF) — Amendement 1)
Change published on 5.7.2010
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