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Standard ISO 21859:2019 18.6.2019 preview

ISO 21859:2019

Fine ceramics (advanced ceramics, advanced technical ceramics) — Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment

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STANDARD published on 18.6.2019


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The information about the standard:

Designation standards: ISO 21859:2019
Publication date standards: 18.6.2019
SKU: NS-953202
The number of pages: 4
Approximate weight : 12 g (0.03 lbs)
Country: International technical standard
Category: Technical standards ISO

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The category - similar standards:

Advanced ceramics

Annotation of standard text ISO 21859:2019 :

Description / Abstract: This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.

Latest update: 2026-08-09 (Number of items: 2 292 444)
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