We need your consent to use the individual data so that you can see information about your interests, among other things. Click "OK" to give your consent.
Surface chemical analysis — Depth profiling — Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering
Translate name
STANDARD published on 15.6.2022
Designation standards: ISO 23170:2022
Publication date standards: 15.6.2022
SKU: NS-1064983
The number of pages: 29
Approximate weight : 87 g (0.19 lbs)
Country: International technical standard
Category: Technical standards ISO
Description / Abstract: This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).
Do you want to make sure you use only the valid technical standards?
We can offer you a solution which will provide you a monthly overview concerning the updating of standards which you use.
Would you like to know more? Look at this page.
Latest update: 2026-05-26 (Number of items: 2 280 003)
© Copyright 2026 NORMSERVIS s.r.o.