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Surface chemical analysis — Depth profiling — Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering
Translate name
STANDARD published on 15.6.2022
Designation standards: ISO 23170:2022
Publication date standards: 15.6.2022
SKU: NS-1064983
The number of pages: 29
Approximate weight : 87 g (0.19 lbs)
Country: International technical standard
Category: Technical standards ISO
Description / Abstract: This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).
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