Standard ISO 23170:2022 15.6.2022 preview

ISO 23170:2022

Surface chemical analysis — Depth profiling — Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering

Translate name

STANDARD published on 15.6.2022


Language
Format
AvailabilityIN STOCK
Price231.80 USD excl. VAT
231.80 USD

The information about the standard:

Designation standards: ISO 23170:2022
Publication date standards: 15.6.2022
SKU: NS-1064983
The number of pages: 29
Approximate weight : 87 g (0.19 lbs)
Country: International technical standard
Category: Technical standards ISO

The category - similar standards:

Chemical analysis

Annotation of standard text ISO 23170:2022 :

Description / Abstract: This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).

We recommend:

Updating of laws

Do you want to be sure about the validity of used regulations?
We offer you a solution so that you could use valid and updated legislative regulations.
Would you like to get more information? Look at this page.




Cookies Cookies

We need your consent to use the individual data so that you can see information about your interests, among other things. Click "OK" to give your consent.

You can refuse consent here.

Here you can customize your cookie settings according to your preferences.

We need your consent to use the individual data so that you can see information about your interests, among other things.