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The information about the standard:
Designation standards: ISO 8181:2023
Publication date standards: 16.10.2023
SKU: NS-1156171
The number of pages: 10
Approximate weight : 30 g (0.07 lbs)
Country: International technical standard
Category: Technical standards ISO
The category - similar standards:
Manufacturing engineering (Vocabularies)Surface treatment and coating in general
Annotation of standard text ISO 8181:2023 :
Description / Abstract: This document defines general terms and film growth processes for atomic layer deposition (ALD). ALD technique is classified into conventional time separated ALD and spatial ALD according to the separation between sequential surface reactions of precursors on substrate. Besides planar substrate, ALD can be used for coating on micro-nano particles, which is developed as powder ALD. Some energy enhanced ALD techniques are also included. This document specifies the processes of different ALD methods. This document applies to the process of ALD. This document does not apply to the deposited materials or specific nanostructures. This document applies to industrial production, scientific research, teaching, publishing and scientific and technological communications related to ALD.
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