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ASTM F1893-11 Historical

Guide for Measurement of Ionizing Dose-Rate Survivability and Burnout of Semiconductor Devices

WITHDRAWN published on 1.1.2011

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86.00 USD


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ASTM F1893-18 Historical

Guide for Measurement of Ionizing Dose-Rate Survivability and Burnout of Semiconductor Devices (Withdrawn 2023)

WITHDRAWN published on 1.3.2018

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86.00 USD


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ASTM F1893-98 Historical

Guide for Measurement of Ionizing Dose-Rate Burnout of Semiconductor Devices

WITHDRAWN published on 10.5.1998

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86.00 USD


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ASTM F1893-98(2003) Historical

Guide for Measurement of Ionizing Dose-Rate Burnout of Semiconductor Devices

WITHDRAWN published on 10.5.1998

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86.00 USD


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ASTM F1894-98 Historical

Test Method for Quantifying Tungsten Silicide Semiconductor Process Films for Composition and Thickness

WITHDRAWN published on 10.5.1998

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86.00 USD


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ASTM F1894-98(2003) Historical

Test Method for Quantifying Tungsten Silicide Semiconductor Process Films for Composition and Thickness

WITHDRAWN published on 10.5.1998

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86.00 USD


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ASTM F1894-98(2011) Historical

Test Method for Quantifying Tungsten Silicide Semiconductor Process Films for Composition and Thickness (Withdrawn 2020)

WITHDRAWN published on 1.6.2011

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86.00 USD


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ASTM F1895-10 Historical

Practice for Submersion of a Membrane Switch

WITHDRAWN published on 1.5.2010

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77.00 USD


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ASTM F1895-10a Historical

Practice for Submersion of a Membrane Switch (Includes all amendments And changes 1/20/2014).

WITHDRAWN published on 1.12.2010

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77.00 USD


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ASTM F1895-14 Historical

Standard Test Method for Submersion of a Membrane Switch (Withdrawn 2023)

WITHDRAWN published on 1.1.2014

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77.00 USD


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