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Standards JIS - Japanese technical standards - Page 658

JIS covers industrial and mineral products, comparable to standards established by various industrial associations for specific needs, or standards established and used by companies (operation manuals, products specifications etc.). The need for common practices in companies of the same industrial sector leads to the establishment of industrial association standards, and the same need in terms of wider applications promotes the establishment of JIS.

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JIS K0139:2026

General rules for laser ablation ICP spectrometry

Standard published on 23.3.2026

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JIS K0141:2000

Surface chemical analysis -- Data transfer format

Standard published on 31.10.2000

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JIS K0142:2000

Surface chemical analysis -- Information formats

Standard published on 31.10.2000

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JIS K0143:2023

Surface chemical analysis -- Secondary-ion mass spectrometry -- Determination of boron atomic concentration in silicon using uniformly doped materials

Standard published on 20.2.2023

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JIS K0144:2018

Surface chemical analysis -- Glow discharge optical emission spectrometry (GD-OES) -- Introduction to use

Standard published on 20.2.2018

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JIS K0145:2002

Surface chemical analysis -- X-ray photoelectron spectrometers -- Calibration of energy scales

Standard published on 30.4.2002

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JIS K0146:2002

Surface chemical analysis -- Sputter depth profiling -- Optimization using layered systems as reference materials

Standard published on 30.4.2002

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JIS K0147-1:2017

Surface chemical analysis -- Vocabulary -- Part 1: General terms and terms used in spectroscopy

Standard published on 21.8.2017

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JIS K0147-2:2017

Surface chemical analysis -- Vocabulary -- Part 2: Terms used in scanning-probe microscopy

Standard published on 21.8.2017

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JIS K0148:2026

Surface chemical analysis-Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy

Standard published on 20.1.2026

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Entries shown from 6570 to 6580 out of a total of 11847 entries.