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Standard Specification for Pure Aluminum (Unalloyed) Source Material for Electronic Thin Film Applications (Withdrawn 2020)
Automatically translated name:
Standard Specification for Pure Aluminum (Unalloyed) Source Material for Electronic Thin Film Applications
STANDARD published on 1.6.2011
Designation standards: ASTM F1513-99(2011)
Note: WITHDRAWN
Publication date standards: 1.6.2011
SKU: NS-50590
The number of pages: 2
Approximate weight : 6 g (0.01 lbs)
Country: American technical standard
Category: Technical standards ASTM
Keywords:
aluminum, coating, evaporation, sputtering, targets, thin films, vacuum coating, Aluminum electrical conductors (semiconductors), Electronic materials/applications--specifications, Electronic thin-film applications--specifications, Evaporators/evaporation--specifications, Sputtering process/targets--specifications, Targets, Vacuum electronic applications, ICS Number Code 31.200 (Integrated circuits. Microelectronics)
1. Scope | ||
1.1 This specification covers pure aluminum metal (unalloyed) for use in evaporation sources and sputtering targets. This material is intended as a raw material for electronic applications. The material is used as-supplied in some cases (for example, as e-beam evaporation sources). In other instances it may be remelted, alloyed, cast and processed by the purchaser to make finished products (for example, sputtering targets). 1.2 This specification sets purity grade levels, physical attributes, analytical methods, and packaging. 1.3 The values stated in SI units are to be regarded as standard. No other units of measurement are included in this standard. |
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2. Referenced Documents | ||
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1.12.2010
WITHDRAWN
1.7.2010
1.2.2001
WITHDRAWN
1.2.1996
1.6.2003
1.1.2000
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