JIS - Japanese technical standards - Page 605

Standards JIS - Japanese technical standards - Page 605

JIS covers industrial and mineral products, comparable to standards established by various industrial associations for specific needs, or standards established and used by companies (operation manuals, products specifications etc.). The need for common practices in companies of the same industrial sector leads to the establishment of industrial association standards, and the same need in terms of wider applications promotes the establishment of JIS.

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JIS H0603:1978

Measurement of minority carrier life time in germanium by photoconductive decay method

Standard published on 31.3.1978

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JIS H0604:1995

Measuring of minority-carrier lifetime in silicon single crystal by photoconductive decay method

Standard published on 31.7.1995

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JIS H0607:1978

Determination of conductivity type in germanium by thermoelectromotive method

Standard published on 10.3.1978

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JIS H0609:1999

Test methods of crystalline defects in silicon by preferential etch techniques

Standard published on 29.2.2000

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JIS H0610:1966

Method of measurement of etch pit density of germanium crystal

Standard published on 31.1.1967

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JIS H0611:1994

Methods of measurement of thickness, thickness variation and bow for silicon wafer

Standard published on 28.2.1994

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JIS H0613:1978

Visual inspection for sliced and lapped silicon wafers

Standard published on 5.1.1978

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JIS H0614:1996

Visual inspection for silicon wafers with specular surfaces

Standard published on 31.1.1996

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JIS H0615:2021

Test method for determination of impurity concentrations in silicon crystal by photoluminescence spectroscopy

Standard published on 21.9.2021

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JIS H1012:2001

General rules for chemical analysis of copper and copper alloys

Standard published on 31.1.2001

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Entries shown from 6040 to 6050 out of a total of 11691 entries.


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